| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV light source device which can effectively collect high-speed ion debris generated when a laser beam is applied to a target. <P>SOLUTION: The EUV light source device includes a chamber for generating extreme ultraviolet light, a target supply means having an injection nozzle for injecting a target substance and generating a droplet of the target substance, a charging means for charging the droplet, a laser for generating plasma by irradiating the charged droplet with the laser beam, a collector mirror for condensing the extreme ultraviolet light emitted from the plasma and emitting the condensed light, a target substance collecting device for collecting the target substance which does not contribute to generation of the plasma and the debris generated in generating the plasma, and an acceleration means for accelerating the charged droplet and ion debris by generating an electric field on an upstream side and downstream side of a position where the laser beam is applied to the droplet. <P>COPYRIGHT: (C)2010,JPO&INPIT |
