| 摘要 |
PURPOSE: A photosensitive polymer and a photoresist composite including thereof are provided to control the solubility of the photosensitive polymer to a developer and the contact angle of a photoresist, and to improve the resolution of a lithography process. CONSTITUTION: A photosensitive polymer is marked with chemical formula 1. In the chemical formula 1, R1, R2 and R3 are hydrogen or methyl groups. R4 is a linear, branched, monocyclic, or multicyclic alkyl group of C1~C40. R5 is a linear, branched, monocyclic, or multicyclic alkyl group including an ether group or an ester group. N is an integer selected from 1~15. X is a linear or branched alkyl group of C5~C120 containing heteroatom. |
