AN EXPOSURE SYSTEM AND AN EXPOSURE METHOD

摘要

PURPOSE: An exposure system and an exposure method are provided to reduce the exposure variation according to the scale deformation about each layer of a substrate by performing alignment based on the scale factor compensated by using an auto scale exposure mode. CONSTITUTION: A global scale factor is calculated by comparing the alignment mark formed on a lower layer of a substrate with the reference mark of an exposure device, and global alignment is performed(S1). The lower layer is exposed to by using the exposure device(S2). The scale factor about the upper layer is calculated(S3). In case the scale factor escapes the allowable standards scale range of the substrate, The scale factor is recompensed within the allowable standards scale range and the compensated scale factor is calculated(S4). Alignment is performed by using the compensated scale factor and the upper layer is exposed(S5).