| 摘要 |
PURPOSE: A vacuum deposition device, which controls the angle of a heater module is provided to evenly form a film on a substrate by rotating a heater module. CONSTITUTION: A vacuum deposition device comprises a vacuum chamber(10), a substrate holder(11), a heater module(20) and an angle control part(30). The substrate holder is installed on the inner top of the vacuum chamber and supports a substrate. The heater module comprises a receiving part and a main body. The main body member is cylindrical shape. An opening is formed on the top of the main body member. The heater module discharges the deposition source toward the substrate by heating the deposition source. The angle control part can control an angle toward the floor side of the vacuum chamber.
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