发明名称 Alignment condition determination method and apparatus of the same, and exposure method and apparatus of the same
摘要 Alignment parameters determination method with less overlay error after exposure without tremendous expending time and cost is provided. Provision is made of a fetching unit performing position measurement and statistical processing to obtain reference computation results. Another fetching unit obtains reference processing results by positioning and exposing shots at a predetermined exposure apparatus based on the reference computation results, then measuring overlay error for the shots. Another fetching unit changes at least parts of the predetermined alignment parameters and performs position measurement and statistical processing to obtain comparative computation results. A controller 650 calculates estimated overlay error when assuming positioning and exposure of shots at a predetermined exposure apparatus based on the comparative computation results using the reference computation results, comparative computation results, and reference processing results.
申请公布号 US7746446(B2) 申请公布日期 2010.06.29
申请号 US20050594836 申请日期 2005.03.29
申请人 NIKON CORPORATION 发明人 OKITA SHINICHI
分类号 G03B27/42;G01B11/00;G03B27/32;G03B27/58;G03F9/00;H01L21/027 主分类号 G03B27/42
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