发明名称 LIQUID DISCHARGE HEAD AND METHOD OF MANUFACTURING A SUBSTRATE FOR THE LIQUID DISCHARGE HEAD
摘要 <p>PURPOSE: A liquid discharge head and a method for manufacturing a substrate for a liquid discharge head are provided to form feed holes with high density and thereby improve the strength of a liquid discharge head. CONSTITUTION: A method for manufacturing a substrate for a liquid discharge head comprises a step of arranging a plurality of concave parts on the rear side of a Si substrate in <100> direction. An etching solution is selected so that the etching speed of the Si substrate on {100} plane is lower than that on {110} plane. A crystal-axis anisotropic etching of the Si substrate is carried out through the concave parts, thereby forming a plurality of liquid feed holes.</p>
申请公布号 KR20100071912(A) 申请公布日期 2010.06.29
申请号 KR20090123747 申请日期 2009.12.14
申请人 CANON KABUSHIKI KAISHA 发明人 MORISUE MASAFUMI;SUZUKI TAKUMI;KUBOTA MASAHIKO;KANRI RYOJI;OKANO AKIHIKO;HIRAMOTO ATSUSHI
分类号 C23F1/24;B41J2/16;C23F1/32 主分类号 C23F1/24
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