发明名称 |
LIQUID DISCHARGE HEAD AND METHOD OF MANUFACTURING A SUBSTRATE FOR THE LIQUID DISCHARGE HEAD |
摘要 |
<p>PURPOSE: A liquid discharge head and a method for manufacturing a substrate for a liquid discharge head are provided to form feed holes with high density and thereby improve the strength of a liquid discharge head. CONSTITUTION: A method for manufacturing a substrate for a liquid discharge head comprises a step of arranging a plurality of concave parts on the rear side of a Si substrate in <100> direction. An etching solution is selected so that the etching speed of the Si substrate on {100} plane is lower than that on {110} plane. A crystal-axis anisotropic etching of the Si substrate is carried out through the concave parts, thereby forming a plurality of liquid feed holes.</p> |
申请公布号 |
KR20100071912(A) |
申请公布日期 |
2010.06.29 |
申请号 |
KR20090123747 |
申请日期 |
2009.12.14 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MORISUE MASAFUMI;SUZUKI TAKUMI;KUBOTA MASAHIKO;KANRI RYOJI;OKANO AKIHIKO;HIRAMOTO ATSUSHI |
分类号 |
C23F1/24;B41J2/16;C23F1/32 |
主分类号 |
C23F1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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