METHOD FOR SELECTIVELY MASKING A SUBSTRATE DURING AN ELECTROPOLYMERISATION PROCESS
摘要
<p>The invention relates to a method for masking at least one given area of the surface of a substrate made from a conductive and oxidisable material during an electropolymerisation process, in particular electrolysis, in order to deposit a polymer film (8) on the surface of the substrate (2). According to the invention, the electropolymerisation is performed by simultaneously exposing the area (7) to be masked to a focused beam (60) of ultrasound waves (6) having a power value higher than 1 watt. The invention is suitable for use in the electronics industry.</p>
申请公布号
WO2010070127(A1)
申请公布日期
2010.06.24
申请号
WO2009EP67588
申请日期
2009.12.18
申请人
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);LALLEMAND, FABRICE;HIHN, JEAN-YVES;HALLEZ, LOIC;ET TAOUIL, ABDESLAM