DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK USING CONTINUOUS DERIVATIVES CHARACTERIZING THE MANUFACTURABILITY ON A CONTINUOUS SCALE

摘要

PURPOSE: A method for determining the manufacturability of a lithographic mask using continuous derivatives is provided to determine the manufacturability of the lithographic mask by selecting a plurality of target-edge pairs from the mask layout data of the lithographic mask. CONSTITUTION: A target-edge is selected from the mask layout data of a lithographic mask(402). A plurality of target-edge pairs is selected(404). The manufacturability of the lithographic mask is determined(406). The manufacturability of the lithographic mask is output(408). The lithographic mask is optimized based on the manufacturability(410). The lithographic mask is manufactured(412). The instance of a semiconductor device is manufactured using the lithographic mask(414).