| 摘要 |
PURPOSE: A (meth)acrylate compound, photosensitive polymer, and resist composition are provided to control acid diffusion and to improve side wall roughness. CONSTITUTION: A (meth)acrylate compound with cyclo group contains a nitrogen of chemical formula 1. A photosensitive polymer comprises a repeat unit induced by compounds of chemical formulas 1, 2, 3, and 4. A resist polymer comprises the photosensitive polymer, photoacid generator, and solvent. The photosensitive polymer is contained in 5-15 weight parts based on 100 weight parts of resist composition. The photoacid generator is triarylsulfonium salts, diaryliodonium salts, sulfonates, or mixture thereof.
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