发明名称 |
PHASE MASK FOR PROCESSING OPTICAL FIBERS, AND ITS FABRICATION METHOD |
摘要 |
The invention relates to an optical fiber-processing phase mask which enables a phase mask with a groove pitch varying in a position-dependent manner to be easily obtained by electron beam writing, and its fabrication method. In the optical fiber-processing phase mask comprising on one surface of a transparent substrate a repetitive pattern of grooves (26) and strips (27) located in a grating form, so that an optical fiber is irradiated with diffracted light according to the repetitive pattern to make a diffraction grating in said optical fiber by an interference fringe of diffracted light of different orders, a plurality of patterns (A1 to A3) having a linearly or nonlinearly increasing or decreasing pitch are juxtaposed, with a constant width ratio between the grooves (26) and the strips (27). The phase mask is fabricated by carrying out writing while the groove-and-strip patterns with a different pitch are juxtaposed.
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申请公布号 |
CA2580820(C) |
申请公布日期 |
2010.06.22 |
申请号 |
CA19982580820 |
申请日期 |
1998.07.02 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
SEGAWA, TOSHIKAZU;KURIHARA, MASAAKI |
分类号 |
G02B5/18;G02B5/26;G02B6/136 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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