| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion plating apparatus which can form a film having stable film characteristics on a workpiece by suppressing the re-vaporization of a formed film deposit which has been deposited on a hearth by the vaporization of a film material, or suppressing the deposition of a formed film deposit on the hearth, and to provide a film-forming method. Ž<P>SOLUTION: The ion plating apparatus has a structure which controls a surface temperature of an exposed face 5b of the hearth 5 in the inner part of a vacuum chamber 3 to a first temperature region which suppresses the re-vaporization of the formed film deposit that has deposited on the exposed face 5b of the hearth 5 by the vaporization of a tablet 21, or a second temperature region which suppresses the deposition of the vaporized tablet 21 onto the exposed face 5b of the hearth 5. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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