| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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| 申请公布号 |
US2010149514(A1) |
申请公布日期 |
2010.06.17 |
| 申请号 |
US20100714829 |
申请日期 |
2010.03.01 |
| 申请人 |
ASML NETHERLANDS B.V.;ASML HOLDING NV |
发明人 |
KEMPER NICOLAAS RUDOLF;COX HENRIKUS HERMAN MARIE;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA;VAN DER TOORN JAN-GERARD CORNELIS;VERHAGEN MARTINUS CORNELIS MARIA;BELFROID STEFAN PHILIP CHRISTIAAN;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN |
| 分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
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