| 摘要 |
PURPOSE: An exposure apparatus and a manufacturing method thereof are provided to accurately revise the projection factor of a projection optical system when the temperature difference exists between the inside and the outside of the chamber. CONSTITUTION: An exposure apparatus comprises the following: a measuring unit(M) operating a measurement for calculating the deformation amount of a reticle(1); and a controller(30) computing the information showing the relation between the time of the reticle receiving an exposure light, and the deformation amount, and the anticipated amount of deformation of the reticle, and revising the projection factor of a projection optical system(3) in order to revise the anticipated amount of deformation of the reticle. |
