发明名称 COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME
摘要 The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.
申请公布号 US2010151379(A1) 申请公布日期 2010.06.17
申请号 US20090631061 申请日期 2009.12.04
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TAKEMOTO ICHIKI;ANDO NOBUO
分类号 G03F7/004;C07D311/02;C07D311/96 主分类号 G03F7/004
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