| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition or the like for highly precisely and stably forming fine patterns and forming a chemical amplification positive type resist film by responding to active light or radiation and having excellent nano-edge roughness, sensitivity and resolution. <P>SOLUTION: The composition contains a resin, an acid generating agent expressed by formula (b1), and a low molecular compound. The low molecular compound contains a compound expressed by formula (c1), a compound having two nitrogen atoms, and one of compounds or the like having three or more nitrogen atoms. <P>COPYRIGHT: (C)2010,JPO&INPIT |
