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发明名称
plasma processing apparatus and plasma processing method
摘要
申请公布号
KR100963299(B1)
申请公布日期
2010.06.11
申请号
KR20080004550
申请日期
2008.01.15
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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