| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which is advantageous in measuring the transmission of an optical element, and to provide a method of manufacturing a device using it. <P>SOLUTION: In the exposure apparatus, the first light quantity of reflected light, reflected at an original stage reference mark 21 provided on an original stage 20, is measured by a reflected light monitor 16; the original stage reference mark 21 is withdrawn from an optical path, the second light quantity of reflected light reflected at a substrate stage reference mark 27 provided on a substrate stage 24 via a projection optical system 23 is measured in the reflected light monitor 16; and the transmission of the projection optical system 23 is obtained on the basis of the ratio of the first light quantity and the second light quantity. <P>COPYRIGHT: (C)2010,JPO&INPIT |
