| 摘要 |
The present invention provides a process for producing a photosensitive resin plate or relief printing plate having a recessed and projected pattern, which comprises the steps of: making a liquid containing an ink-repellent component (A) and a curing component (B) attach to the plate surface of the photosensitive resin plate or relief printing plate having a recessed and projected pattern prior to the post-treatment step or during the post-treatment step, wherein the ink-repellent component (A) comprises at least one compound selected from the group consisting of silicon-based compounds, fluorine-based compounds and paraffin-based compounds, and provides a treatment liquid which is suitable for the process for producing the photosensitive resin plate or the relief printing plate having the recessed and projected pattern.
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