首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
摘要
申请公布号
JP4474515(B2)
申请公布日期
2010.06.09
申请号
JP20020334008
申请日期
2002.11.18
申请人
发明人
分类号
A43B17/00;A43B17/14
主分类号
A43B17/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Display device using semiconductor light emitting devices
Underfill pattern with gap
Semiconductor device
Method for processing a semiconductor workpiece and semiconductor workpiece
Semiconductor device and semiconductor device manufacturing method using patterning and dry etching
Interconnect structure with footing region
Wiring substrate
Method of source/drain height control in dual epi finFET formation
Gate tie-down enablement with inner spacer
Methods for bonding substrates
System, method and apparatus for using optical data to monitor RF generator operations
Plasma processing apparatus
Charged particle beam drawing apparatus, information processing apparatus and pattern inspection apparatus
Charged particle beam system and method of operating a charged particle beam system
Electromagnetic contactor
Electrode material for batteries, electrode material paste for batteries, method for manufacturing the electrode material for batteries, dye-sensitized solar cell, and storage battery
Solid electrolytic capacitor and method for manufacturing same
Antenna module, communication device and method of manufacturing antenna module
Printed circuit board including inductor
Solenoid robust against misalignment of pole piece and flux sleeve