| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin-film element capable of simplifying the whole process and minimizing the change of characteristics of the thin-film element in a transfer process. <P>SOLUTION: The manufacturing method of the thin-film element includes a stage for forming a sacrificing layer on a first substrate, a stage for forming a thin-film laminate on the sacrificing layer, a stage for forming separating grooves for exposing the sacrificing layer to split the thin-film laminate into at least one thin-film element, a stage for removing the sacrificing layer partially utilizing a dry etching process, (in this stage, at least one thin-film element is maintained on the first substrate in a remaining sacrificing layer region.), a stage for temporary connecting a supporting structure to the at least one thin-film element, a stage for separating at least one thin-film element connected to the supporting structure from the first substrate (in this stage, the remaining sacrificing layer region is removed.), a stage for connecting at least one thin-film element connected to the supporting structure to a second substrate, and a stage for separating the supporting structure from at least one thin-film element. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
