发明名称 LASER WASHING DEVICE THAT IS POSSIBLE TO INSPECTION PARTICLE
摘要 PURPOSE: A laser washing device capable of inspecting a particle is provided to improve work efficiency by inspecting a particle on the wafer without moving the wafer after cleaning the wafer. CONSTITUTION: In a laser washing device capable of inspecting a particle, a laser scan apparatus(1) is arranged inside a laser cleaning chamber(51). The laser scan apparatus inspects the particle on the wafer. A controller(3) is installed outside the cleaning chamber in order to control the laser scan apparatus.
申请公布号 KR20100054516(A) 申请公布日期 2010.05.25
申请号 KR20080113474 申请日期 2008.11.14
申请人 SEMES CO., LTD. 发明人 YIM, KWANG KUK;LEE, SE WON;KOO, KYO WOOG
分类号 H01L21/302;H01L21/66 主分类号 H01L21/302
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