发明名称 |
LASER WASHING DEVICE THAT IS POSSIBLE TO INSPECTION PARTICLE |
摘要 |
PURPOSE: A laser washing device capable of inspecting a particle is provided to improve work efficiency by inspecting a particle on the wafer without moving the wafer after cleaning the wafer. CONSTITUTION: In a laser washing device capable of inspecting a particle, a laser scan apparatus(1) is arranged inside a laser cleaning chamber(51). The laser scan apparatus inspects the particle on the wafer. A controller(3) is installed outside the cleaning chamber in order to control the laser scan apparatus.
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申请公布号 |
KR20100054516(A) |
申请公布日期 |
2010.05.25 |
申请号 |
KR20080113474 |
申请日期 |
2008.11.14 |
申请人 |
SEMES CO., LTD. |
发明人 |
YIM, KWANG KUK;LEE, SE WON;KOO, KYO WOOG |
分类号 |
H01L21/302;H01L21/66 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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