发明名称 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus
摘要 There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.
申请公布号 US7723243(B2) 申请公布日期 2010.05.25
申请号 US20070707022 申请日期 2007.02.16
申请人 SEIKO EPSON CORPORATION 发明人 SHINTATE TSUYOSHI;MIKOSHIBA TOSHIAKI;WADA KENJI;SAKURADA KAZUAKI;YAMADA JUN
分类号 H01L21/31 主分类号 H01L21/31
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