发明名称 |
Method and apparatus for irradiating laser |
摘要 |
A laser irradiation process includes: scanning a substrate with laser having a predetermined lasing frequency at different irradiation intensities to form a plurality of first irradiation areas corresponding to the irradiation intensities; illuminating the first irradiation areas to reflected light receive from the fist irradiation areas; determining microcrystallization intensity based on the received reflected light; and determining irradiation intensity based on the thus determined microcrystallization intensity. The laser irradiation process uses the irradiation intensity for irradiating a polycrystalline film in a product semiconductor device.
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申请公布号 |
US7724382(B2) |
申请公布日期 |
2010.05.25 |
申请号 |
US20070737640 |
申请日期 |
2007.04.19 |
申请人 |
NEC CORPORATION;NEC LCD TECHNOLOGIES, LTD. |
发明人 |
NAKATA MITSURU;SHIMAMOTO HIROFUMI;KANOH HIROSHI |
分类号 |
G01B11/00;G01B11/28;G01J3/46 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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