| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a four-probe resistivity measuring device that has improved measurement accuracy of resistivity by uniformizing contact between a probe and a wafer. <P>SOLUTION: The four-probe resistivity measuring device includes a four-probe unit for detecting the resistivity of a thin film to be inspected on a wafer, a driving unit for driving the four-probe unit vertically, a detection unit for detecting vertical position information on the four-probe unit, a rotationally driving unit for rotating a stage where the wafer is mounted, an angle detection unit for detecting the angle of rotation of the stage, and a control unit which detects and stores the vertical position information on a plurality of positions where the four-probe unit comes in contact with the wafer at a plurality of positions on the wafer using the driving unit, rotary driving unit, detection unit, and angle detection unit, and then measures the resistivity of the thin film to be inspected on the wafer after correcting the vertical position of the four-probe unit based upon the plurality of stored pieces of position information when measuring the resistivity. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
