发明名称 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation source that radiates more uniform extreme ultraviolet rays (EUV). <P>SOLUTION: A source configured to generate EUV radiation includes: a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma; and a collector arranged to collect EUV radiation emitted by the plasma. The optics are arranged such that in use the fuel vaporizing and exciting radiation is incident upon more than one side of the fuel droplet at the interaction point. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010114442(A) 申请公布日期 2010.05.20
申请号 JP20090247188 申请日期 2009.10.28
申请人 ASML NETHERLANDS BV 发明人 LOOPSTRA ERIK ROELOF;BANINE VADIM YEVGENYEVICH;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BUURMAN ERIK PETRUS
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址