METHOD AND ARRANGEMENT FOR PROVIDING CHALCOGENS

摘要

The invention relates to a method and an arrangement for providing chalcogens in the form of thin layers on substrates, in particular on planar substrates prepared with precursor layers and composed of any desired materials, preferably on substrates composed of float glass. The invention is intended to provide a very fast and cost-effective coating method for chalcogens, in particular for applying thin layers of the chalcogens within the range of 100 nm to 10μ, or mixtures of these materials, on planar substrates, and also an apparatus suitable for carrying out the method. This is achieved by forming an inlet-and outlet-side gas curtain for the oxygen-tight closure of a transport channel (6) in a vapour deposition head (11), introducing an inert gas into the transport channel (6) for displacing the atmospheric oxygen, introducing one or more substrates (3) to be coated, said substrates being temperature-regulated to a predetermined temperature, into the transport channel (6) of the process chamber (1), introducing a chalcogen vapour/carrier gas mixture from a source into the transport channel (6) at the vapour deposition head above the substrates (3) and forming a selenium layer on the substrates by means of PVD at a predetermined pressure, and removing the substrates (3) after the predetermined process time has elapsed.