THIN-FILM MULTILAYER STRUCTURE, COMPONENT COMPRISING SAID STRUCTURE AND ITS METHOD OF DEPOSITION

摘要

The invention relates to a corrosion-resistant thin-film multilayer structure having a low wear rate and a low coefficient of friction, comprising 1 to 1000 periods, one period comprising 2 to 100 layers (A, B) based on carbon, silicon and hydrogen, and optionally a functional surface layer (FSL). The invention also relates to a component comprising the thin-film multilayer structure and to its method of deposition.