发明名称 Advanced droplet and plasma targeting system
摘要 Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.
申请公布号 US7718985(B1) 申请公布日期 2010.05.18
申请号 US20060586975 申请日期 2006.10.26
申请人 UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. 发明人 BERNATH ROBERT;BROWN CHRISTOPHER;DUNCAN JOSHUA;TAKENOSHITA KAZUTOSHI;RICHARDSON MARTIN;CUNADO JOSE A.
分类号 H01J35/08 主分类号 H01J35/08
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