MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING DEVICE, AND METHOD TO DESIGN OPTICAL SURFACE

摘要

PROBLEM TO BE SOLVED: To improve an optical system which can be used as a projection objective mirror in a microlithography projection aligner concerning resolution in illumination wavelengths.

SOLUTION: The microlithography projection optical system (101) includes a plurality of elements arranged to image radiation from an object plane (103) to an image plane (102), at least one of the elements being a reflective element that has a rotationally asymmetric surface positioned in a path of the radiation. The rotationally asymmetric surface deviates from a rotationally symmetric surface by about 10 nm or more.

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