| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To suppress mixture of water in an organic material in a crucible, and to improve the stability of a film deposition rate and pressure during the film deposition. <P>SOLUTION: In a material pretreatment chamber 1 provided on a preceding stage of a film deposition chamber 2, an organic material subjected to the sublimation and purification in a crucible 4 is heated by a pretreatment heater 6, and melted and solidified in the environment having a reduced water content. In the material pretreatment step, the water content is removed from the organic material in the crucible 4, and the material filling factor of the organic material is increased to enhance the stability of the film deposition in the film deposition chamber 2. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
