发明名称 METHOD OF DETECTING A INNER TUBE PRESSURE OF POLISHING HEAD IN CHEMICLA MECHANICAL POLISHING DEVICE
摘要 PURPOSE: An inner tube pressure detecting method of a polishing head of a CMP(Chemical Mechanical Polishing) apparatus is provided to reduce unnecessary pause of a CMP apparatus by detecting the pressure of an inner tube in a real time and informing the abnormality. CONSTITUTION: A pressure of an inner tube is detected in a real time with an inner tube pressure sensor(S210). A detected inner tube pressure is determined whether it is within an allowable pressure range(S220). If the detected inner tube pressure is within allowable pressure range, a tube pressure is displayed to the outside with an indicator(S262). If the detected inner tube pressure is within allowable range, a CMP process is executed(S264). The detected inner tube pressure is not within the pressure range, an alarm signal is generated and the CMP process is stopped(S270).
申请公布号 KR20100045093(A) 申请公布日期 2010.05.03
申请号 KR20080104138 申请日期 2008.10.23
申请人 DONGBU HITEK CO., LTD. 发明人 CHA, HYUN KI
分类号 H01L21/66;H01L21/304 主分类号 H01L21/66
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