发明名称 PASSIVATION LAYER FOR A CIRCUIT DEVICE AND METHOD OF MANUFACTURE
摘要 <p>According to one embodiment of the disclosure, a method for passivating a circuit device generally includes providing a substrate having a substrate surface, forming an electrical component on the substrate surface, and coating the substrate surface and the electrical component with a first protective dielectric layer. The first protective dielectric layer is made of a generally moisture insoluble material having a moisture permeability less than 0.01 gram/meter 2 /day, a moisture absorption less than 0.04 percent, a dielectric constant less than 10, a dielectric loss less than 0.005, a breakdown voltage strength greater than 8 million volts/centimeter, a sheet resistivity greater than 1015 ohm- centimeter, and a defect density less than 0.5/centimeter 2 . To be accompanied, when published, by Figure 1 of the accompanying drawings.</p>
申请公布号 IL200234(D0) 申请公布日期 2010.04.29
申请号 IL20090200234 申请日期 2009.08.04
申请人 RAYTHEON COMPANY 发明人
分类号 H01L 主分类号 H01L
代理机构 代理人
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