发明名称 SHADOW MASK
摘要 <p>A shadow mask comprising: a thick rigid backing layer having a plurality of large apertures, and a polymer thin film on the thick rigid backing layer having a plurality of fine apertures corresponding to the plurality of large apertures. Also a method of fabricating a shadow mask and a method of shadow masking.</p>
申请公布号 SG160234(A1) 申请公布日期 2010.04.29
申请号 SG20080065765 申请日期 2008.09.08
申请人 SONY CORPORATION 发明人 TONG CHENG CHEOW;ISHIDA TAKEHISA;JIANMIN MIAO
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