发明名称 |
Method of data encoding, compression, and transmission enabling maskless lithography |
摘要 |
A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
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申请公布号 |
US7704653(B2) |
申请公布日期 |
2010.04.27 |
申请号 |
US20070624652 |
申请日期 |
2007.01.18 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
LORDI VINCENZO;LEVI SHEM-TOV;HESS HARALD F. |
分类号 |
G03F9/00;G03C5/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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