发明名称 Method of manufacturing a wiring substrate and semiconductor device
摘要 A wiring substrate includes a base insulating film, a first interconnection formed on a top surface side of the base insulating film, a via conductor provided in a via hole formed in the base insulating film, and a second interconnection provided on a bottom surface side of the base insulating film, the second interconnection being connected to the first interconnection via the via conductor. The wiring substrate includes divided-substrate-unit regions, in each of which the first interconnection, the via conductor, and the second interconnection are formed.
申请公布号 US7701726(B2) 申请公布日期 2010.04.20
申请号 US20080340267 申请日期 2008.12.19
申请人 NEC ELECTRONICS CORPORATION;NEC CORPORATION 发明人 TSUKANO JUN;OGAWA KENTA;MAEDA TAKEHIKO;YAMAMICHI SHINTARO;KIKUCHI KATSUMI
分类号 H05K1/11;H01K1/14 主分类号 H05K1/11
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