| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system for performing non contact cleaning of the surface of an object, a lithography device including the system, and a device manufacturing method. <P>SOLUTION: The system may include: a He plasma source contained in a chamber; and a control unit configured so as to correct plasma parameters such as an electronic energy distribution of plasma when used, in order to increase formation of a He metastable atom without correcting operation parameters of the plasma source. The control unit may include an electrical bias unit configured so as to apply a positive bias voltage to the object to pull in a free electron from the plasma. The system is previously mixed with He, or may include a supply source of supplement gas to be supplied from a further gas source. The supplement gas may be selected based on previous knowledge of types of a particle to be expected to be present on the surface of the object. <P>COPYRIGHT: (C)2010,JPO&INPIT |
