| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide photomask blanks which, even when a light blocking material is contained in large quanity, cure with high sensitivity upon exposure and is excellent in storage stability and safelight aptitude, and a photomask which is produced using the photomask blanks, enables image formation with high resolution, and ensures high linearity of an image edge part. <P>SOLUTION: The photomask blanks have on a substrate a photosensitive composition layer containing (A) a sensitizing dye represented by general formula (1), (B) a polymerization initiator, (C) a compound having an ethylenically unsaturated bond, (D) a binder polymer, and (E) a light blocking material, wherein X represents N or -C(R<SP>6</SP>)-; and R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>, R<SP>4</SP>, R<SP>5</SP>, R<SP>6</SP>, R<SP>7</SP>and R<SP>8</SP>each independently represent H or a monovalent substituent, provided that one or more combinations selected from adjacent two of R<SP>1</SP>to R<SP>8</SP>, R<SP>8</SP>and R<SP>5</SP>, and R<SP>7</SP>and R<SP>6</SP>may form a ring by bonding. <P>COPYRIGHT: (C)2010,JPO&INPIT |
