发明名称 LIGHT SOURCE APPARATUS, EXPOSURE DEVICE, EXPOSURE METHOD, AND MANUFACTURING METHOD OF DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a light source apparatus which can precisely detect pressure at each component of gas in an apparatus body without depending on the pressure of gas in the apparatus body, and to provide an exposure device, an exposure method and a manufacturing method of the device. <P>SOLUTION: Mass analyzers 55 and 69 detecting partial pressure at each component of the gas are arranged in chambers 53 and 65 communicating with inner parts of apparatus bodies 18 and 19 through communicating passages 52 and 61. Openings of flow rate adjusting valves 54 and 62 are adjusted based on detection results of the mass analyzers 55 and 69. A flow rate of the gas derived into the chamber 53 and 65 from the apparatus bodies 18 and 19 through the communicating passages 52 and 61 is controlled. Suction forces of induction blowers 59 and 64 are adjusted, the flow rate of the gas discharged from the chambers 53 and 65 through the communicating passages 58 and 63 is controlled and the partial pressure of the gas in the chambers 53 and 65 is adjusted to be settled in a detection range of the mass analyzers 55 and 69. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010087365(A) 申请公布日期 2010.04.15
申请号 JP20080256608 申请日期 2008.10.01
申请人 NIKON CORP 发明人 MATSUNARI SHUICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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