发明名称 ELECTRON MICROSCOPE
摘要 <P>PROBLEM TO BE SOLVED: To adjust phase differences and improve on their interference properties in a device using electron beams, since, in case of focusing electron beams by a lens or using them, phase differences of the electron beams occur due to an effect of spherical aberration to hinder obtention of a substantial interference effect. Ž<P>SOLUTION: The electron microscope performs adjustment and deletion of phase differences due to differences of electron beam paths, generated at focusing or image formation of the electron beams by a lens. To be more concrete, a phase plate, for instance, with its thickness changed from the center in a radius vector direction is used, and either or both of a thickness effect and a potential effect are used to adjust phases of the electron beams. Further, the invention is achieved by a potential adjustment function, temperature adjustment function, phase plate atmospheric gas pressure adjustment mechanism, phase plate astigmatic correction mechanism, phase plate inclination position height adjustment mechanism or the like. With this, a PTEM image is heightened to a high resolution, for achievement of universal uses. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010086691(A) 申请公布日期 2010.04.15
申请号 JP20080252130 申请日期 2008.09.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAGAOKI ISAO;TANIGAKI TOSHIAKI
分类号 H01J37/295;H01J37/26 主分类号 H01J37/295
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