POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE: A positive type photosensitive resin composition is provided to ensure high sensitivity, high definition, good pattern, excellent residue removal property, and excellent film uniformity and to maintain the balance of viscosity and solid content. CONSTITUTION: A positive type photosensitive resin composition comprises (A) a polybenzoxazole precursor having a repeating unit represented by chemical formula 1, (B) a photosensitive diazoquinone compound, (C) a silane compound, (D) a dissolution modifier, and (E) a solvent. The dissolution modifier is selected from the group consisting of an alicyclic alcohol compound, an aromatic alcohol compound with a alicyclic ring, and combinations thereof.