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发明名称
INDUCTIVELY COUPLED PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION DEVICE
摘要
申请公布号
KR100952533(B1)
申请公布日期
2010.04.12
申请号
KR20070099138
申请日期
2007.10.02
申请人
发明人
分类号
C23C16/48
主分类号
C23C16/48
代理机构
代理人
主权项
地址
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