DEVICE FOR MEASURING SUPERFINE PARTICLE MASSES

摘要

A device for measuring superfine particle masses including a quartz oscillator and an exposure system having at least two measuring chambers. Each of the at least two measuring chambers has a same geometry, a deposition surface for particles, and an aerosol feed directed at the respective disposition surface configured to feed an aerosol onto the respective deposition surface. At least one of the respective deposition surfaces is disposed on the quartz oscillator.