发明名称 SURFACE EMITTING LASER AND MANUFACTURING METHOD THEREFOR
摘要 Provided is a surface emitting laser or the like capable of suppressing horizontal misalignment between the surface relief structure and the current confining structure to make higher the precision of the alignment, to thereby obtain single transverse mode characteristics with stability. The surface emitting laser having a semiconductor layer laminated therein includes: a first etching region formed by etching a part of the upper mirror; and a second etching region formed by performing etching from a bottom portion of the first etching region to a semiconductor layer for forming a current confining structure, in which a depth of the second etching region is smaller than a depth of the first etching region.
申请公布号 US2010080258(A1) 申请公布日期 2010.04.01
申请号 US20090562605 申请日期 2009.09.18
申请人 CANON KABUSHIKI KAISHA 发明人 IKUTA MITSUHIRO
分类号 H01S5/00;H01L33/00 主分类号 H01S5/00
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