发明名称 POROUS MATERIAL AND METHOD FOR PRODUCING POROUS MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a porous material which has through-holes of a submicrometer order, does not cause pressure loss when a medium is made to flow into the through-holes, is chemically inert as well, also has sufficient strength and can be stably used over a long period of time. Ž<P>SOLUTION: The porous material has the through-holes almost parallel to the thickness direction and includes crystalline alumina. The porous material is obtained, e.g. by immersing an aluminum base material into an electrolytic solution, performing electrolytic treatment so as to form an amorphous anodized film on the surface of the aluminum base material, next peeling the anodized film from the aluminum base material, arranging the same between a pair of plate-like members, further constraining the same by a pair of the plate-like members, and subjecting the anodized film to heat treatment while being constrained by a pair of the plate-like members so as to be crystallized. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010064924(A) 申请公布日期 2010.03.25
申请号 JP20080232830 申请日期 2008.09.11
申请人 TOSHIBA CORP 发明人 HARAGUCHI SATOSHI;KAMEDA TSUNEJI;ITO YOSHIYASU;SHINDO TAKAHIKO;HAYAMI TOKUSUKE;KURI YUUJI;TANAKA AKIRA
分类号 C04B38/00;B01D71/02;C01F7/02 主分类号 C04B38/00
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