发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING GRAFTED SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a grafted substrate, allowing obtainment of the grafted substrate which has a high grafting rate by reducing generation of homopolymer. SOLUTION: The method for manufacturing the grafted substrate comprises: a reaction active spot generation step of generating a reaction active spot on a polymer substrate; a graft polymerization reaction step of performing graft polymerization of a reactive monomer on the polymer substrate on which the reaction active spot is generated; and a functional group introduction step of introducing a functional group into a formed graft chain, in which the reaction active spot generation step and the graft polymerization reaction step are separately performed. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010065106(A) |
申请公布日期 |
2010.03.25 |
申请号 |
JP20080231550 |
申请日期 |
2008.09.09 |
申请人 |
JAPAN ATOMIC ENERGY AGENCY;JAPAN CARLIT CO LTD:THE;ERH TECHNO RESEARCH:KK |
发明人 |
SEKO NORIAKI;HOSHINA HIROYUKI;KASAI NOBORU;TAMADA MASAO;KIRYU TOSHIYUKI;TAKAHASHI MAKIKATSU |
分类号 |
C08J7/12;C08F291/00 |
主分类号 |
C08J7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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