发明名称 METHOD AND APPARATUS FOR MANUFACTURING GRAFTED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a grafted substrate, allowing obtainment of the grafted substrate which has a high grafting rate by reducing generation of homopolymer. SOLUTION: The method for manufacturing the grafted substrate comprises: a reaction active spot generation step of generating a reaction active spot on a polymer substrate; a graft polymerization reaction step of performing graft polymerization of a reactive monomer on the polymer substrate on which the reaction active spot is generated; and a functional group introduction step of introducing a functional group into a formed graft chain, in which the reaction active spot generation step and the graft polymerization reaction step are separately performed. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010065106(A) 申请公布日期 2010.03.25
申请号 JP20080231550 申请日期 2008.09.09
申请人 JAPAN ATOMIC ENERGY AGENCY;JAPAN CARLIT CO LTD:THE;ERH TECHNO RESEARCH:KK 发明人 SEKO NORIAKI;HOSHINA HIROYUKI;KASAI NOBORU;TAMADA MASAO;KIRYU TOSHIYUKI;TAKAHASHI MAKIKATSU
分类号 C08J7/12;C08F291/00 主分类号 C08J7/12
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