发明名称 |
Photoresist edge bead removal measurement |
摘要 |
An edge bead removal measurement method includes determining an edge of a wafer about a circumference of the wafer. A location of a wafer notch on the edge of the wafer is determined. A location of a center of the wafer is determined. A distance from the edge of the wafer to an edge bead removal line about the circumference of the wafer is determined.
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申请公布号 |
US7684611(B2) |
申请公布日期 |
2010.03.23 |
申请号 |
US20070676140 |
申请日期 |
2007.02.16 |
申请人 |
RUDOLPH TECHNOLOGIES, INC. |
发明人 |
SIMPKINS PATRICK |
分类号 |
G06K9/00;A61N5/00;G01B7/00;G01R31/26;G06T7/00;H01L |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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