METHOD AND APPARATUS FOR ELECTROSTATIC DECHUCKING FOR DIELECTRIC WORKPIECE IN VACUUM PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a reliable method and apparatus for electrostatically chucking and dechucking a workpiece in a vacuum plasma processor. SOLUTION: A glass workpiece 32 processed in a vacuum plasma processing chamber 10 is dechucked from a monopolar electrostatic chuck 30 by gradually reducing a chucking voltage during processing while maintaining the voltage high enough to clamp the workpiece. The chucking voltage during processing is controlled in response to a flow rate of a heat transfer fluid flowing to the chuck to maintain a chucking force and the flow rate substantially constant. A reverse polarity voltage applied to the chuck at an end of the processing assists in dechucking. COPYRIGHT: (C)2010,JPO&INPIT