发明名称 |
ABRASIVE SLURRY FOR GLASS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive slurry for glass capable of highly accurately working a polishing surface of glass and performing polishing at a comparatively high speed. <P>SOLUTION: The maximum particle diameter Tmax of abrasive particles measured by a transmission electron microscope is 90 nm or below, the maximum particle diameter Tmax and an average particle diameter Tavg of the abrasive particles measured by the transmission electron microscope satisfy Tmax/Tavg≥3 and particle size distribution of the abrasive particles has at least a first peak appearing in the vicinity of the average particle diameter value and a second peak appearing in the vicinity of a particle diameter 3 times as large as Tavg or larger. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010059310(A) |
申请公布日期 |
2010.03.18 |
申请号 |
JP20080226283 |
申请日期 |
2008.09.03 |
申请人 |
MITSUI MINING &, SMELTING CO LTD |
发明人 |
YAMAGUCHI YASUHIDE;OGATA SUMIKAZU |
分类号 |
C09K3/14;B24B37/00;B82Y99/00 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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