发明名称 High-Throughput CVD System
摘要 The use of deposition modules groups for each CVD deposition position including at least two deposition modules, together with a Motion Control System that controls and confines the motion of said deposition modules, enables a quick deposition module exchange at the deposition locations of On-Line or Off-Line CVD coating system. This results in a high volume large area CVD coating system that can increase the commercial viability of a given CVD system design through production throughput increases, production cost reductions, overall higher process flexibility and/or improved film quality.
申请公布号 US2010068384(A1) 申请公布日期 2010.03.18
申请号 US20090559961 申请日期 2009.09.15
申请人 CVD EQUIPMENT CORPORATION 发明人 ROSENBAUM LEONARD;STROBL KARLHEINZ;DECKER PAUL J.
分类号 C23C16/00;B23P6/00 主分类号 C23C16/00
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