发明名称 |
MASS ANALYSIS METHOD, AND METHOD AND DEVICE FOR MANUFACTURING SAMPLE FOR MASS ANALYSIS |
摘要 |
PROBLEM TO BE SOLVED: To reduce air pollution and electrification of the surface of a sample and suppressing spattering of residual elements without installing an FIB device on an SIMS device. SOLUTION: A mass analysis method analyzes a predetermined area 14 on the surface of an object 10 to be analyzed in the depth direction based on a secondary ion 25 generated from the predetermined area 14. In the method, a sample 16 for mass analysis is prepared by: a recess forming step for forming a recess 15 which is deeper than the area for the mass analysis and wider than an irradiation area 23 irradiated with a primary ion beam, around the predetermined area 14; and a conductive film formation step for forming a conductive film 13 on the surface of the object 10 to be analyzed including the predetermined area 14 and the recess 15. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010054456(A) |
申请公布日期 |
2010.03.11 |
申请号 |
JP20080222172 |
申请日期 |
2008.08.29 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
KOBAYASHI KEIKO;IMAKITA KENICHI |
分类号 |
G01N27/62;G01N1/28;G01N23/225 |
主分类号 |
G01N27/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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