发明名称 MASS ANALYSIS METHOD, AND METHOD AND DEVICE FOR MANUFACTURING SAMPLE FOR MASS ANALYSIS
摘要 PROBLEM TO BE SOLVED: To reduce air pollution and electrification of the surface of a sample and suppressing spattering of residual elements without installing an FIB device on an SIMS device. SOLUTION: A mass analysis method analyzes a predetermined area 14 on the surface of an object 10 to be analyzed in the depth direction based on a secondary ion 25 generated from the predetermined area 14. In the method, a sample 16 for mass analysis is prepared by: a recess forming step for forming a recess 15 which is deeper than the area for the mass analysis and wider than an irradiation area 23 irradiated with a primary ion beam, around the predetermined area 14; and a conductive film formation step for forming a conductive film 13 on the surface of the object 10 to be analyzed including the predetermined area 14 and the recess 15. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010054456(A) 申请公布日期 2010.03.11
申请号 JP20080222172 申请日期 2008.08.29
申请人 ULVAC JAPAN LTD 发明人 KOBAYASHI KEIKO;IMAKITA KENICHI
分类号 G01N27/62;G01N1/28;G01N23/225 主分类号 G01N27/62
代理机构 代理人
主权项
地址